Internal Hex Connection’s Submerged Implant System
It is possible to adjust the implantation depth by reducing the fixture placement resistance.
By applying a tapered thread to the straight body, the stress applied to the upper part of the fixture is effectively dispersed. The thread depth decreases upwards, reducing friction on the cortical bone.
The depth of the fixture is varied by changing the depth of the body part, and stable implantation is possible, like a straight type, in a fixture with a long depth.
Even with weak bone quality by applying a taper, initial entry is easy even when drilling is weak.
Since it has a platform switching structure, stable prosthetic connection is possible.
Tightness between fixture and abutment and load distribution are excellent.
Tightness between fixture and abutment and load distribution are excellent.
The gentle round shape can reduce tissue damage caused by implants when used in the maxillary sinus.
Designed for long-term tissue health and stability, the UFII implant features a hybrid SLA (sandblasted and acid-etched) surface. A finer roughness at the coronal portion helps reduce peri-implantitis risk, while optimized roughness along the body and apex supports predictable osseointegration.
Hex 1.7
Hex 2.5
Hex 2.5
Size Chart
Size Chart
Size Chart
A dedicated DIO NAVI kit for UFII/UFIII fixtures (Ø3.8–Ø5.0), designed for guided implant procedures. Based on a standard 9.0 mm offset with Guide Sleeve: GS 53BL.
